Physics-Informed Neural Systems for the Simulation of EUV Electromagnetic Wave Diffraction from a Lithography Mask

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Laser discharge in a high-pressure jet of heavy noble gas: Expansion of emitting volume promises an efficient source of EUV light for lithography
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Showing 20 of 27 references

Founder's Pitch

"A hybrid neural operator for efficient simulation of EUV electromagnetic wave diffraction from lithography masks."

Physics-Informed Neural NetworksScore: 4View PDF ↗

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